It is not the same kind of equipment. ASML machines use a 500 watt EUV source in order to be able to expose a few wafers per minute. The tabletop device has the output power listed as "1 uw-10 mw". This is a source intended of spectroscopy instrumentation, not for exposing wafers.
> This is only the EUV light source, not an entire wafer fab.
When we say "EUV machine" in the semiconductor context, it's pretty unambiguous that we're talking about a lithography machine using EUV and that can do, at least, ~120 300 mm wafers per hour.
As another comment explained, that machine you linked to is nothing like what we mean by "EUV machine", it's not even attempting to be a lithography tool.
At first I thought you were being willingly misleading but your wording suggests you're not, so I suggest binging Asianometry on YouTube if you'd like to get up to speed on the semi industry.
Who falls for this crap? An ASML EUV machine costs over $100 million and is delivered in dozens of shipping containers, taking up 2 floors in a fab.
You're going to need really extraordinary evidence that the PRC has a "desktop sized EUV machine" if you want us to believe you.